| abstract |
Provided is a method of manufacturing a nitride system III-V compound layer which improves the quality and facilitates the manufacturing process and a method of manufacturing a substrate employing the method of manufacturing a nitride system III-V compound layer. A first growth layer is grown on a growth base at a growth rate, in a vertical direction to the growth surface, higher than 10 μm/h. Subsequently, a second growth layer is grown at a growth rate, in a vertical direction to the growth surface, lower than 10 μm/h. The first growth layer grown at the higher growth rate has a rough surface. However, the second growth layer is grown at the lower growth rate than that used for growing the first growth layer, so that depressions of the surface of the first growth layer are filled and thus the surface of the second growth layer is flattened. Further, growth takes place laterally so as to fill the depressions of the surface of the first growth layer. Thus, dislocation extending from the first growth layer bends laterally and density of dislocation propagating to the surface of the second growth layer is greatly lowered. |