http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6653639-B1

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filingDate 2000-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2003-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a3d6b02d75942a6da48cc6ffbe81250
publicationDate 2003-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6653639-B1
titleOfInvention Chuck for mounting reticle to a reticle stage
abstract A lithography system for processing a substrate is disclosed. The lithography system includes a stage for moving the substrate relative to a beam. The lithography system further includes a chuck for securely holding the substrate during stage movement. The lithography system additionally includes a support assembly for holding the chuck in a fixed position relative to the stage while accommodating for deformations in either the chuck or the stage during processing so as to precisely locate the substrate relative to the stage and to reduce external stresses that cause substrate distortions.
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Total number of triples: 54.