| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-946 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-56 |
| filingDate |
2002-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09220d7f052ea07478eb2bcfcf6fcdb8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a06eef0003ed80952a9a0f1336eae48d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18a1da4636402283d001a7cdac04ca40 |
| publicationDate |
2003-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6645856-B2 |
| titleOfInvention |
Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate |
| abstract |
A pattern is transferred to a resist film on a wafer by a reduction projection exposure method using a half-tone phase-shift mask in which is formed a half-tone phase-shifter pattern including a thin-film pattern functioning as an attenuator and a resist pattern functioning as the photosensitive composition for phase adjustment. This method improves the accuracy of dimensions of the pattern transferred to the wafer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100461424-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7794897-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005077267-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003148635-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6872646-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005250022-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8367276-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7622336-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009075185-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010159709-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8142961-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6958292-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7018556-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005145929-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004081921-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007148936-A1 |
| priorityDate |
2001-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |