| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-22 |
| filingDate |
2001-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ece4996ab2f31e7f5aa862fc4ddd85b1 |
| publicationDate |
2003-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6613492-B2 |
| titleOfInvention |
Photosensitive polymer having phenyl ring and lactone group and resist composition comprising the same |
| abstract |
A photosensitive polymer having a phenyl ring and a lactone group, and a resist composition, wherein the resist composition contains a photosensitive polymer including a monomer unit having at least one group selected from the groups indicated by the following formulas, and a photoacid generator (PAG). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006216635-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20020049876-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7374860-B2 |
| priorityDate |
2000-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |