http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6610145-B2

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filingDate 2001-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2003-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eee171726273f82c798aea2bdc62b21e
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publicationDate 2003-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6610145-B2
titleOfInvention Deposition of nanoporous silica films using a closed cup coater
abstract A process for forming a uniform nanoporous dielectric film on a substrate. The process includes horizontally positioning a flat substrate within a cup; depositing a liquid alkoxysilane composition onto the substrate surface; covering the cup such that the substrate is enclosed therein; spinning the covered cup and spreading the alkoxysilane composition evenly on the substrate surface; exposing the alkoxysilane composition to water vapor and base vapor to thereby form a gel; and then curing the gel. The invention also provides an apparatus for spin depositing a liquid coating onto a substrate. The apparatus has a cylindrical cup with an open top section and removable cover which closes the top. A vapor injection port extends through the center of the cover. Suitable means hold a substrate centered within the cup and spin the cup.
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priorityDate 1998-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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