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filingDate 2001-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2003-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7878e5961d9b1dec2267590dc241db18
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publicationDate 2003-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6602801-B2
titleOfInvention Method for forming a region of low dielectric constant nanoporous material
abstract A method for forming a region of low dielectric constant nanoporous material is disclosed. In one embodiment, the present method includes the step of combining a plurality of materials to form a solution. In the present embodiment, the plurality of materials comprising a low dielectric constant material, a pore generator material, and a solvent. In this embodiment, the present method then applies the solution to a surface above which it is desired to form the region of low dielectric constant nanoporous material. Next, the present embodiment subjects the solution, which has been applied to the surface, to a thermal process such that a region of low dielectric constant nanoporous material is formed above the surface.
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