| abstract |
There are provided a photosensitive polymer and a photoresist compositing containing the same. The photosensitive polymer is represented by the following formula:wherein R1 is an acid-labile tertiary alkyl ester group, R2 is hydrogen atom, methyl, ethyl, carboxyl, gamma-butyrolactone-2-yl ester, gamma-butyrolactone-3-yl ester, pantolactone-2-yl ester, mevalonic lactone ester, 3-tetrahydrofuranyl ester, 2,3-propylenecarbonate-1-yl ester, 3-methyl-gamma-butyrolactone-3-yl ester or C3 to C20 alicyclic hydrocarbon, a/(a+b+c) is 0.1~0.7, b/(a+b+c) is 0.1~0.8, c/(a+b+c) is 0.0~0.8, and n is an integer in the range of 0 to 2. |