http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6587202-B2

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-33
filingDate 2000-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2003-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_576ff271521c69648300a7f5a886198e
publicationDate 2003-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6587202-B2
titleOfInvention Optical materials testing method
abstract A method for testing a material block prior to forming the material block into one or more optical components for use with a sub-micron lithographic, high power, narrow bandwidth laser system having high wavelength stability includes the step of selecting a block of material having appropriate characteristic optical properties for the source laser system being used. The next step is to test the material block for absorption performance. Then, if the block exhibits a sufficient absorption performance, then one of more optical components such as one or more prisms, etalons, and/or windows, etc. are formed from the material block. Finally, the optical components formed from the block are inserted into a wavelength selection module of the resonator of the laser to participate in producing a high power, narrow bandwidth laser beam which may be used in sub-micron photolithographic applications.
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priorityDate 2000-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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