abstract |
An ester compound of the following formula (1) is provided. n R 1 is H, methyl or CH 2 CO 2 R 3 , R 2 is H, methyl or CO 2 R 3 , R 3 is C 1 -C 15 alkyl, Z is a divalent C 2 -C 20 hydrocarbon group which forms a single ring or bridged ring with the carbon atom, m is 0 or 1, n is 0, 1, 2 or 3, and 2m+n=2 or 3. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for micropatterning using electron beams or deep-UV. |