| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bc055673c8c87d1b113940b514507604 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S428-91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2323-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24967
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24975
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31598
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31667
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2377-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-06 |
| filingDate |
1999-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_220d72caeed588e7d47aca7a21fbcb34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3da80cf65b6d19ec9a2f44939fcabec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b74e67e97c0017ecf7c6f5c7ce89ba8c |
| publicationDate |
2003-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6548108-B1 |
| titleOfInvention |
Process for manufacturing packaging film |
| abstract |
A process for manufacturing a packaging film that is transparent to UV light and has a barrier action against water vapor and gases. The packaging film includes a substrate film of a polyolefin or polyamide with a ceramic coating layer of SiOx, where x is a number from 1.5 to 1.8. The thickness of the ceramic coating layer is 10 nm to 2 mum. The ceramic coating layer of SiOx is deposited onto the polyolefin or polyamide substrate film using a vacuum thin film deposition process by depositing silicon oxide (SiO2) and elementary silicon (Si) simultaneously in vacuum. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7166889-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7568579-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6652957-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009104392-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7008501-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007114139-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007061489-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003211243-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007061489-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6878229-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004013009-A1 |
| priorityDate |
1997-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |