| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2000-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebfc74fd838561a2a24b0521c7e31474
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be5db2255dfa18695a03ec68d4c28216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06029a2bc4f226e0ef73536173e33255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04e484e77dbaf917880645c054912449 |
| publicationDate |
2003-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6503682-B1 |
| titleOfInvention |
Photoresist composition, preparation method thereof and method for forming a pattern during semiconductor processing using the photoresist composition |
| abstract |
A positive photoresist composition having improved sensitivity and resolution, a method of making the composition, and a method for forming a pattern during semiconductor processing using the composition are disclosed. The photoresist composition includes: (i) a photosensitive material obtained by mixing a first photosensitive compound represented by formula (1) and a second photosensitive compound represented by formulae (2a) or (2b); (ii) a resin; and (iii) a solvent. The invention enables the formation of patterns with an exceptional profile due to a high degree of sensitivity and resolution of the photoresist composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6790582-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6905809-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012052438-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004197704-A1 |
| priorityDate |
1999-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |