http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6494062-B2

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filingDate 2001-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2002-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fbdd0321b12657657ca72e32931ea52
publicationDate 2002-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6494062-B2
titleOfInvention Fused silica having high resistance to optical damage
abstract This invention relates to a method of rendering fused silica resistant to compaction caused by UV laser beam irradiation. The method of the invention results is a fused silica member that is desensitized to compaction caused by the long-term exposure to UV laser beams. The invention includes a means to pre-compact fused silica members using high energy radiation.
priorityDate 1996-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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