http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6465149-B2

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filingDate 2000-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2002-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2002-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6465149-B2
titleOfInvention Solution to be optically treated, a method for forming an antireflection film, a method for pattern-plating and a method for manufacturing a thin film magnetic head
abstract A solution to be optically treated including a cyclopentanone solvent, polymethylglutarimide and a light absorption dye is applied onto a body to be plated 100 including an inclined portion 200 , and thereafter, is thermally treated to form an antireflection film 300 . Then, a photoresist 400 is applied so as to cover the antireflection film. Subsequently, a photolithography process to form a plate-pattern on the body to be plated is carried out for the photoresist 400 and the antireflection film 300.
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