http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6447694-B1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aafe0172ffd94d3486c518b0709bb2b3
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
filingDate 2000-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2002-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b2bb880fe2a4a1df4a3bf34c4383c06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d4d367e50b6ce0b5c4f9552259500c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b6deaf0e3c5b35bd352bd52be0efcab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0af34cb21c9ed5859dc0a95a18493aa
publicationDate 2002-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6447694-B1
titleOfInvention Composition for chemical mechanical polishing
abstract Disclosed is a polishing composition which comprises an Al2O3/SiO2 composite-based metal oxide powder, deionized water and an additive, said metal oxide powder comprising an Al2O3/SiO2 composite as an essential component. The polishing composition is superior in removal rate and free of causing microscratches after polishing and thus, suitable for use in the global planarization of device wafer surfaces.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8361177-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005227491-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7569205-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003146190-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007075291-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006156635-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004244911-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10320854-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7117459-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005044801-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6896710-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009100765-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003150838-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005062016-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6787056-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6953389-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004148581-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7452815-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006032149-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010301014-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016056054-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10144849-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8062547-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6930054-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009133336-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006096179-A1
priorityDate 1999-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5858813-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5354490-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5516346-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5084071-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6027554-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5264010-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9713889-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0816457-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0786504-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9740030-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5728308-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226406400
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16212404
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226406399
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226426013
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226482943
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21225612
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226543629
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16773
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID33613
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID441404
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID226395608
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6131

Total number of triples: 75.