| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-442 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-444
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-145
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-14 |
| filingDate |
2001-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c86bd05d0f377b53b318c53def61ecab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a53dc0dfb903064ad217d064cc703e25
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_680ba3c12b6109bb8d93bb9a13e0f758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b996ff0e7c40329fba7daa6494001a5 |
| publicationDate |
2002-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6436281-B2 |
| titleOfInvention |
Apparatus for treating wastewater from a chemical-mechanical polishing process used in chip fabrication |
| abstract |
Wastewater from a chemical-mechanical polishing process (CMP) used in semiconductor chip fabrication has hitherto been, and is still being, discharged into the public sewage system after chemical neutralization and sedimentation. This has the drawback that water consumption is considerable. It is therefore an object of the invention to reduce the total amount of wastewater produced that has to be discharged. This is achieved by the wastewater to be treated being subjected to an ultra-filtration. This allows the treated CMP wastewater to be reused within the plant. In particular, it can be recycled in order again to recover therefrom deionized water of a very high purity for operational purposes, e.g. for CMP. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10343118-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009274596-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013299406-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10329171-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006248919-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002168926-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7052599-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6722958-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012211418-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011174745-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004069878-A1 |
| priorityDate |
1997-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |