Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d1c776c980e5b7ad88acf139deabd792 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
filingDate |
1999-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2002-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f12b49839181d6b784f680eb4d5e6107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91d9d6c9da9fe906b5bc2f8e61b553a3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9798898fca3f24da7369e0d266ed898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_181b9c9cd699f151382f414a95faad96 |
publicationDate |
2002-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6410447-B2 |
titleOfInvention |
Process for removing photoresist material |
abstract |
A process for removing photoresist material without any residues left and damage to the in-process substrate is described. The present process for removing photoresist on an in-process substrate comprises the steps of providing a cover layer which is to be etched on the in-process substrate and providing a layer of photoresist material thereon. The photoresist layer is patterned, exposed and developed. Then, the developed photoresist layer is further exposed without using a mask. The cover layer is etched with the use of the patterned photoresist layer. After etching, the photoresist material is removed by a solvent. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006286804-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007148809-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7560300-B2 |
priorityDate |
1998-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |