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filingDate 2000-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2002-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2002-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6406609-B1
titleOfInvention Method of fabricating an integrated circuit
abstract The present invention provides an aqueous electroplating solution. The aqueous electroplating solution includes a copper salt comprising a weight by weight percent of the electroplating solution between about 0.1% to about 2.5%. The electroplating solution also includes an inorganic acid having a dissociation constant of less than about 2.0, and comprising a weight by weight percent of the electroplating solution between about 0.1% to about 10%. The electroplating solution further includes a hydrogenated halide and a modulator, each that comprises a weight by weight percent of the electroplating solution between about 0.0001% to about 1%.
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