http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6403151-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a62c92e56568bd104089aac22ca487b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 |
| filingDate | 2000-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2002-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f9fd939292b1a1a0f03f023bca132cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbf870048f54219804ef14e3d927ae34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a41859ba7173a1afad081fb2a21ecc5d |
| publicationDate | 2002-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-6403151-B1 |
| titleOfInvention | Method for controlling optical properties of antireflective coatings |
| abstract | A method is used by a semiconductor processing tool. The method comprises forming a first layer above a substrate layer, and forming an inorganic bottom antireflective coating layer above the first layer by introducing at least two gases at a preselected ratio into the semiconductor processing tools. A signal indicating that the semiconductor processing tool has been serviced is received, and the ratio of the gases is varied in response to receiving the signal to control optical parameters of the bottom antireflective coating layer to enhance subsequent photolithographic processes. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6573189-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6514865-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7772094-B2 |
| priorityDate | 2000-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 57.