Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88fc7f9eb617072238851d46591a0c76 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-905 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
filingDate |
1999-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2002-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_697fa3d0933c500d53d9fd9746560d20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de5d925703e4b13eebf9081be01fef96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8b4d3883ddd2ffac5d23d7225a138ae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53da593f80bdad051565a93cf0ef7053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cc86b50ec75270d41b9fa02c0a6c022 |
publicationDate |
2002-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6401728-B2 |
titleOfInvention |
Method for cleaning interior of etching chamber |
abstract |
A process for cleaning the interior walls of a reaction chamber after a number of silicon wafers is etched inside the chamber. The cleaning process includes bombarding the interior walls of the chamber with a first type of plasma in a dry cleaning operation, and then bombarding the interior walls of the chamber with a second type of plasma containing the element hydrogen in a warm-up operation. No silicon wafers need to be placed inside the chamber when the dry cleaning operation or the warm-up operation is conducted. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102091703-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007144557-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005096238-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6708700-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004007248-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6635579-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6564810-B1 |
priorityDate |
1999-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |