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filingDate 1999-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationNumber US-6392230-B1
titleOfInvention Focused ion beam forming method
abstract A pattern film forming method comprises the steps of introducing a film forming gas on a sample, scanning a focused ion beam over a preselected area of the sample to form a pattern film on the sample, and reducing the scanning area of the focused ion beam while forming the pattern film on the sample.
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