http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6319733-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate | 1999-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe52aefdcd71bc418a5fb9fc87b3a15e |
| publicationDate | 2001-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-6319733-B1 |
| titleOfInvention | Method of manufacturing semiconductor device, semiconductor equipment and manufacturing system |
| abstract | A manufacturing system compares information of foreign matter sensed by semiconductor equipment from on a semiconductor substrate with a selection reference thereby selecting optimum semiconductor equipment corresponding to the information of the foreign matter from a plurality of semiconductor equipment and processing the semiconductor substrate. Thus, a method of manufacturing a semiconductor device capable of improving the yield of the semiconductor device as well as a manufacturing system and semiconductor equipment to which the manufacturing method is applied, and a semiconductor device manufactured by the same are obtained. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002173870-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6801824-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014329439-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6615101-B1 |
| priorityDate | 1999-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.