| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b7b1787fdafc9a84f27a9e2e702132f8 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-241
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-152 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-2456 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-23 |
| filingDate |
1999-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f544d7967ba5fb0aee70813dd49ae914 |
| publicationDate |
2001-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6268019-B1 |
| titleOfInvention |
Preparation of fluorine modified, low haze, titanium dioxide films |
| abstract |
The present invention concerns the deposition of fluorine modified, titanium dioxide films (TiO2) onto hot glass by atmospheric pressure chemical vapor deposition (APCVD) using TiCl4 vapor. The invention is also suitable for depositing other metallic oxide films from their metallic halides such as SnCl4, GeCl4, and VCl4. The present invention provides a process that deposits a novel, fluorine modified, titanium dioxide film (TiO2) onto hot glass by atmospheric pressure chemical vapor deposition using TiCl4 vapor. The process uses injection of TiCl4 into a hot, nonoxygen containing carrier gas and blends the carrier gas and TiCl4 vapor with an oxygen containing gas stream containing a haze reducing quantity of a fluorine containing compound before contacting a surface of hot glass with the blended mixture. The process is capable of depositing a fluorine modified, TiO2 film at deposition rates exceeding 900 Å per second. The crystalline phase of the fluorine modified film is essentially anatase. The film has a haze of less then 1% and a refractive index of greater than or equal to about 2.48. Also provided is an apparatus for practicing the process and a novel coated glass. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008057225-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8728576-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012240634-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011244130-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016076144-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9528182-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008027087-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2059627-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9938619-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7204885-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002188376-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002195710-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003032283-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/IT-RM20080405-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2347029-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8163342-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009186191-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007157884-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005158997-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7105441-B2 |
| priorityDate |
1998-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |