http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6265134-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2000-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f959c41333fdf7037af4c18afc2e3a8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3d17b3b234ed1afa3d09270b5937c01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88ee237348ddf794ea55454180289a13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aae7347d038359d8d74eeeeb4eb18786 |
| publicationDate | 2001-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-6265134-B1 |
| titleOfInvention | Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching |
| abstract | Acid-catalyzed positive photoresist compositions having generally improved performance (especially photoresist compositions having improved contrast (solubility differential), shrinkage and processing kinetics on radiation exposure) are obtained by use of polymers containing pendant polar-functionalized aromatic groups and acid-labile light crosslinking. The photoresist compositions also may contain a photosensitive acid-generating component as well as a solvent and possibly other auxiliary components. The polymers may contain other functional groups or components designed to impart alkaline-solubility, to provide alkaline-solubility protection in the absence of generated acid, etc.The photoresist compositions can be used to create patterned photoresist structures and further to make conductive, semiconductive or insulative structures by photolithography. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6881677-B1 |
| priorityDate | 1998-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 117.