| abstract |
Methods and systems for catalyzing the low temperature formation of silicon nitride. The methods and systems utilize catalytically reactive silica particles that are suspended by moving air within a reaction chamber and which are maintained at a temperature sufficient to cause the suspended silica particles to become catalytically reactive in the presence of carbon and nitrogen gas. Typically, the reaction chamber is maintained at a temperature in a range from about 150° C. to about 500° C. Moisture is generally provided by the organic matter, although additional moisture may be introduced into the reaction chamber in order to maintain reactivity of the silica particles. The silicon nitride is preferably deposited onto the surface of a metallic substrate, which might be located either within or externally to the reaction chamber. Depending on the ratio of oxygen to nitrogen provided within the reaction chamber, silicon nitride or a mixture of silicon nitride and silicon oxynitride will be produced. |