| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e43b4ca6b41ce9f54c9a895d474c81a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31975
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-5236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-5245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-5209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31993
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31982
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24934 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-5254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-52 |
| filingDate |
1997-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37ba5f12c3adb9276d7366680506aa27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c5226468bae6c9c35803070f8daf4e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f333b8e25c8e388c755c5537064b9001 |
| publicationDate |
2001-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6254958-B1 |
| titleOfInvention |
Photosensitive resin composition and articles |
| abstract |
The present invention aims to develop a photosensitive resin composition which exhibits a rapid ink absorption rate, which has an excellent water resistance, and which is appropriate for providing an ink receiving layer forming a sharp ink dot shape and having an excellent color formability of ink. A photosensitive resin composition forming an excellent ink receiving layer is obtained by incorporating at least one selected from an ethylenically unsaturated group-containing compound having quaternary nitrogen and a grain flour (filler) such as a wheat flour or the like in a photosensitive resin composition containing a quaternary nitrogen-free ethylenically unsaturated group-containing compound, a photopolymerization initiator etc. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8802754-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008255297-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6977100-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007092745-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006194902-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004247803-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8376877-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007092666-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7651748-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004209011-A1 |
| priorityDate |
1996-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |