http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6195873-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a62c92e56568bd104089aac22ca487b |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49165 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate | 1999-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2001-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a55fada3aac4205da00831e00fe8b0b |
| publicationDate | 2001-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-6195873-B1 |
| titleOfInvention | Method for decreasing contact resistance |
| abstract | A method for forming an electrical contact is provided. A base layer having a conductive member is provided. An intermediate layer is formed over at least the conductive member. A photoresist layer is formed and patterned over at least a portion of the intermediate layer to define a contact patterning region above the conductive member. An amount of overlay between the contact patterning region and the conductive member is measured. A size of a contact opening is determined based on the amount of overlay. The contact opening of the determined size is formed in the intermediate layer. The contact opening communicates with the conductive member. |
| priorityDate | 1999-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.