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filingDate 1999-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2001-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_616bce993bbbfa0e28e2d3b916f75733
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publicationDate 2001-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6187522-B1
titleOfInvention Scratch resistant antistatic layer for imaging elements
abstract The present invention is an imaging element having, a support, an image-forming layer superposed on the support and an outermost scratch resistant antistatic layer superposed on the support. The outermost scratch resistant antistatic layer has a thickness between 0.6 and 10 microns. The scratch resistant layer is composed of a polymer having a modulus greater than 100 MPa measured at 20° C. and a tensile elongation to break greater than 50%, a filler particle having a modulus greater than 10 GPa, and an electrically conducting polymer. The volume ratio of the polymer to the filler particle is between 70:30 and 40:60 and the electrically conducting polymer is present at a weight concentration based on a total dried weight of the scratch resistant layer of between 1 and 10 weight percent.
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