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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-406
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B23-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B23-02
filingDate 1998-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2000-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f7b701ec10862206190c4d59d57074f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47fc0418499a617c2d1b80a13971b985
publicationDate 2000-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6139629-A
titleOfInvention Group III-nitride thin films grown using MBE and bismuth
abstract The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 mu m and 20 mu m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7x10-7 cm2/sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.
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priorityDate 1997-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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