| abstract |
Compositions and methods for cleaning, degreasing, stripping, solvating and/or removing residues and contaminants such as oils, grease, dirt, flux, inks, coatings, photoresists, resins and polymers from manufactured articles and hard surfaces such as, but not limited to metals, plastics, textiles, electronic devices, silicon wafers, mechanical devices or manufacturing equipment. The compositions contain at least one 4 carbon cyclic ether solvent mixtures with at least one 3-alkoxy 3-methyl butanol, as well as other optional alkaline materials as well as other optional solvents and additives. The compositions can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present. |