| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate |
1998-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_042dbdedb708cde8839f4a19296a08fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_089b8e4ab23432f519b08f61c8863f7a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7449f7938ca9fd8dbfe4a8cb0cf75111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69546d4449d3b4f09513aaf2ab001ae4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 |
| publicationDate |
2000-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6127087-A |
| titleOfInvention |
Positive photoresist compositions and multilayer resist materials using same |
| abstract |
A positive photoresist composition comprises (A) an alkali-soluble resin, and (B) at least one quinonediazide group-containing compound in which part or all of the hydroxyl groups of a compound represented by the following formula (I) are esterified with a quinonediazidesulfonic acid: ##STR1## wherein each of R 1 and R 2 is an alkyl group having 1 to 5 carbon atoms, and "a" is 0 or 1. The present invention provides a positive photoresist composition which can form a resist pattern having high film residual rate, improved development contrast between exposed portions and unexposed portions, and satisfactory definition, exposure margin, focal depth range properties and sectional shape. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7314702-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6620978-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6551755-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004146809-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6492085-B1 |
| priorityDate |
1997-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |