| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-5096
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-62 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-509
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1998-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a393b4273ac4f1e4bb94be49e1c6d31c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54aefc660eae69761bca0f011d16e713 |
| publicationDate |
2000-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6090530-A |
| titleOfInvention |
Method and apparatus for depositing deep UV photoresist films |
| abstract |
An improved method and apparatus for forming a plasma-polymerized methylsilane (PPMS) photo-sensitive resist material includes the steps of pressurizing the chamber to between about 1 to about 2 Torr, heating the substrate to between about 50 DEG C. and about 200 DEG C., and plasma-polymerizing the precursor methylsilane gas to deposit a stable film having high-photosensitivity at high deposition rates. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03087905-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6740539-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6528331-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6368883-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6323125-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003153198-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6582994-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6221560-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6570256-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6514857-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6825562-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6515355-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6316285-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7190871-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003215203-A1 |
| priorityDate |
1996-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |