http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6083660-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_93cb78b1f0c85639e1200c2af890c14a |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
filingDate | 1995-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2000-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef3814661b688c79b4fad0c57a566b26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0db1245884f6817e0345ee8fc0955971 |
publicationDate | 2000-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-6083660-A |
titleOfInvention | Photopolymerizable, coatable organosol and method |
abstract | Photopolymerizable plastisol and organosol photoresist and solder mask coating compositions are described herein. These compositions include an ethylenically unsaturated photopolymerizable liquid plasticizer; a particulate, thermoplastic resin is dispersed in the plasticizer, the said resin having a midpoint Tg greater than 110 DEG C. and an acid number greater than 110; a tertiary amine stabilizer; and a photoinitiator. The organosol includes a diluent along with the other ingredients. |
priorityDate | 1990-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 133.