| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a62c92e56568bd104089aac22ca487b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-04042 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-05 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 |
| filingDate |
1997-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2000-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf4fdcf563bdb69b16b11cf017e7b3a3 |
| publicationDate |
2000-01-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6010965-A |
| titleOfInvention |
Method of forming high integrity vias |
| abstract |
Aluminum extrusions in overlying vias are prevented by depositing the underlying aluminum layer at a high temperature, preferably at a temperature greater than any temperature to which the wafer is exposed during subsequent processing. Embodiments include sputter depositing the underlying aluminum layer at a temperature of about 430° C. to about 570° C. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6693354-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003151021-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1343203-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7211200-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6124213-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6933580-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6743720-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004124530-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6869879-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6224942-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6703303-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1343203-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6686275-B2 |
| priorityDate |
1997-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |