| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
1997-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_921ddce199d7baccbf0e4828631863ce
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c00933c26f9f3a1988f1f5dde3ba65b2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7d5f334d3a9b848527c651cbd57fac2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21ea83ce09ae1f9de9604b235aaca3f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b87512236a832ad6912f0fff75cfde4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_345046bdcc9f6738adb388f1ecfdbcec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48fc1cc36329db794c31a4765013b864 |
| publicationDate |
1999-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5981146-A |
| titleOfInvention |
Resist coating film |
| abstract |
When a fine pattern is formed by using a chemical-amplification-type resist film, fall of acid in the surface of the resist can be inhibited so that a fine pattern exhibiting an excellent shape is formed. A resist coating film containing a compound having a sulfonic acid group or a carbonic acid group is formed on a chemical-amplification-type resist film of a semiconductor substrate, followed by performing exposure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7354808-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005048289-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6984473-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/NL-1032579-C2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6900117-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003152845-A1 |
| priorityDate |
1992-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |