| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-287
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D163-00 |
| filingDate |
1997-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e576e1c5812aea27831d3a4da0a74609
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1fe20699671129945b78d531734e80c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b1d3d1b364a01ae7be164af54b7fb68 |
| publicationDate |
1999-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5972562-A |
| titleOfInvention |
Visible radiation-curable solder resist compositions, and method for forming solder resist patterns |
| abstract |
A visible radiation-curable solder resist composition which comprises a resin component, a component for promoting photo-polymerization or -crosslinking, and optionally a diluent and any other additives, the resion componebt comprising a novolak resin skeleton and a polyfunctional acrylic monomer and the component for promoting photo-polymerization or -crosslinking comprising a photo-reaction initiator, a sensitizing dye and a heterocyclic compound having at least two endocyclic nitrogen atoms. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012121815-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003131932-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8411455-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011050051-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6913794-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004047507-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2004047507-A2 |
| priorityDate |
1996-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |