| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-906 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02052
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
1996-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a64d6ba4ce27981d300e3b8bd63a8aeb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_006cc682eda781ee5d72db61ee4000eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_624549390cc4a4e8d642a2becfdb8f20 |
| publicationDate |
1999-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5885901-A |
| titleOfInvention |
Rinsing solution after resist stripping process and method for manufacturing semiconductor device |
| abstract |
After the resist is removed with an alkaline solution, a noncorrosive rinse solution is applied to the substrate which is composed of (a) a water-soluble monovalent lower alcohol and an organic or inorganic acid, or (b) a water-soluble monovalent lower alcohol, an organic or inorganic acid and water or (c) an organic or inorganic acid. This rinse solution prevents corrosion completely when a resist is removed from Al-Si-Cu wiring :material, which is widely used as the wiring material for high-density integrated circuits. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6890864-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003134507-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6514875-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1024965-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1024965-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004099289-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6627553-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6546939-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003166482-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11365379-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6156661-A |
| priorityDate |
1994-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |