| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0754 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
1993-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96399f21014ea7d582b96a8b04419607
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_287a4e5bedf8c745758b9123e6f94e15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f17be5a92c88048d71c212e93ed6f02 |
| publicationDate |
1999-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5866306-A |
| titleOfInvention |
Process for use of photosensitive polysilanes as photoresist |
| abstract |
The present invention relates to the use of certain polyalkylphenyl silanes in photoresists to generate positive tone resist images. The polyalkylphenyl silanes have the formula: <IMAGE> where R is C2-C12 alkyl and n is about 150 to 7000. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6589711-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6096598-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6458691-B1 |
| priorityDate |
1991-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |