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filingDate 1997-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1998-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f9ae2773d96d46702265bdde380385d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_702def9b0359c7c8689959878ff7dd39
publicationDate 1998-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5853963-A
titleOfInvention Life extension of photoresist developer solutions
abstract This invention relates to a method for increasing the effective process life and chemical efficiency of use of aqueous-based developer solutions used for chemical development of photoresists such as are used in the printed circuit industry. The activity is maintained by regenerating some of byproducts during the process to active carbonate, by controlled additions of alkaline hydroxide instead if conventional carbonate solution. The pH and thus the development speed can automatically be controlled at any desired constant value. This invention allows simple automation of printed circuit photoresist development, with reduced chemical costs and increased chemical usage efficiency and thus reducing the industrial waste volume.
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priorityDate 1997-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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