| abstract |
A thin conductive film which excels in film strength, weather resistance, transparency, and electric field shielding effect is formed on a glass substrate at a low temperature as a multilayer film which is formed of an ITO-dispersed silicate layer and an overcoat silicate layer, or at least two layers of an ITO dispersed silicate and a high-conductivity oxide-dispersed silicate, and a topmost layer of an overcoat silicate. The ITO dispersed silicate layer includes ultra fine particles of indium tin oxide and a silicate-based glass matrix, and the high-conductivity oxide-dispersed silicate layer consists of includes ultra fine particles selected from the group of ruthenium dioxide, rhenium trioxide, iridium dioxide, rhodium dioxide and irridium-based pyrochlore and a silicate-based glass matrix. |