| abstract |
A composition for forming an electrically conductive layer which is used in patterning of a resist with electric charge beam, which comprises: (a) 0.1 to 20 parts by weight of sulfonated polyanilines with a sulfonic group content ranging from 20 to 80% based on the aromatic ring, the sulfonated polyaniline having a weight average molecular weight of 500 to 100,000 and a molecular weight dispersion of not more than 5, (b) 100 parts by weight of a solvent, and (c) 0.01 to 30 parts by weight of amines and/or quaternary ammonium salts, and if desired, it further comprises 0 to 200 parts by weight of the following substance(s) (A) and/or (B) as component (d): (A) a high molecular weight compound soluble in the aforesaid solvent (b), (B) a surface active agent. |