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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-0874
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-045
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04
filingDate 1996-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1997-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7961ab8bb447e5280ddcd8d49394a7dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91f3afa7986979e56492ef27982e50cb
publicationDate 1997-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5670689-A
titleOfInvention Process for the manufacture of cyclosiloxanes by depolymerization of polysiloxanes
abstract The present invention relates to a process for the manufacture of cyclic polydiorganosiloxanes, especially octamethylcyclotetrasiloxane (D4) and decamethylcyclopentasiloxane (D5) by depolymerization of polydiorganosiloxanes in the presence of an initiator, characterized in that the initiator comprises either: 1) at least one hydroxide chosen especially from the group made up of caesium, rubidium or quaternary phosphonium hydroxides, or: 2) the association of a fluorine-free caesium or rubidium salt, or of a salt of quaternary phosphoniums, with a hydroxyl-containing strong base of an alkali or alkaline-earth metal other than Cs and Rb.
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priorityDate 1995-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 48.