| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8b9b07baa39efdd68eb1506a375245f8 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31696
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31692 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-24 |
| filingDate |
1995-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1997-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d5c56752d4898631f68f0060d6b79d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d94fc5cc63ee4545b87bcdbabaedb10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b8cce49630197741b82194016a738a06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3786e3955ce59b28c9d34df1718fde22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fbc7bcdccfff43244ad1aa0468663b8 |
| publicationDate |
1997-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5635302-A |
| titleOfInvention |
Substrate having coating resistant to environmental etch, coating composition therefor, process for making the coating composition, and process of coating a substrate with the composition |
| abstract |
A sterically-hindered monomer is used to make a polymer which in turn is useful in coating compositions. The resulting residue of the sterically-hindered monomer is present in the polymer, as well as in a cured coating (preferably an automotive coating) produced using a coating composition having the polymer therein. The presence of the residue of the sterically-hindered monomer imparts in the cured coating a resistance to environmental etching. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6113764-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6596347-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6579575-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6863935-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6231932-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6221441-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7011869-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004043156-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010285308-A1 |
| priorityDate |
1991-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |