http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5578413-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-092 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F3-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
filingDate | 1996-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 1996-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4077e5d22eb97463be8b2b82addf97b7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_391b850040de2d082bda7fa4bbd4dc30 |
publicationDate | 1996-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-5578413-A |
titleOfInvention | Image formation method using a photosensitive transfer material |
abstract | A photosensitive transfer material is disclosed including a temporary substrate having provided thereon an alkali-soluble thermoplastic resin layer, an intermediate layer, and a photosensitive resin layer in this order, the transfer material having an interlaminar adhesion which is lowest between the thermoplastic resin layer and the temporary substrate, wherein the alkali-soluble thermoplastic resin layer contains (A) an alkali-soluble thermoplastic resin having a weight average molecular weight of from 50,000 to 500,000 and a glass transition temperature of from 0 DEG to 140 DEG C. and (B) an alkali-soluble thermoplastic resin layer having a weight average molecular weight of from 3,000 to 30,000 and a glass transition temperature of from 30 DEG to 170 DEG C. at an (A)/(B) weight ratio of from 5/95 to 95/5. The transfer material can be transferred to a permanent substrate at a high speed without entrapping air bubbles due to unevenness on the permanent substrate. The temporary substrate can easily be stripped off after transfer. Exposure in air is possible. The thermoplastic resin layer is rapidly removed with an alkali aqueous solution. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8338500-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10216083-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1167063-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6927008-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008176169-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004106061-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1167063-A3 |
priorityDate | 1993-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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