| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_26d218bde68f1a2d7e5aeee41efefc00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G21F9-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G1-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21F9-00 |
| filingDate |
1994-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1996-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_312081781e12e555a91c92eb633ae253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42a8f118d2c7aecf05f3f27d710d46d5 |
| publicationDate |
1996-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5575863-A |
| titleOfInvention |
Process for the chemical cleaning of metal components |
| abstract |
A process for chemical cleaning of metal components having an iron oxide deposit upon a layer of compounds having a high silica content. The process includes the step of preparing an aqueous mixture including an agent for complexing Si(OH) 4 and at least one compound for dissolving the high silica content layer. The dissolving compound is selected from the group consisting of insertion compounds for inserting OH or F ions in the Si(OH) 4 and OH-containing organic compounds. The insertion compounds including electrophilic groups and are selected from the group consisting of conjugated unsaturated systems and unsaturated N-oxide compounds. The OH-containing organic compounds are selected from the group consisting of organic compounds having at least one alcohol function, aromatic amines, soluble salts of tertiary amines, and aromatic amines causing condensation of OH radicals onto silica. The process also includes the step of contacting the metal component with the aqueous medium until the high silica content layer has been dissolved. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011062215-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9914989-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8165261-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8728246-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100937563-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009252275-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2006053626-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005247269-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005187459-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009089991-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009089991-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7302917-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006054668-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9212407-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010313913-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103510097-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012279522-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7861915-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005230457-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006112972-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109323237-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006065212-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8584925-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5841826-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7857911-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011079243-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7611588-B2 |
| priorityDate |
1993-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |