| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0efa077d881a96aeb1e29b21ef1bbb58 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1992-10-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1996-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a419269d3926188265368b3f9eb5b68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbbfd609b0e20a20f952ed253889a0b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4135d126c07f3b0b68d0de86b9db3f18 |
| publicationDate |
1996-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5563022-A |
| titleOfInvention |
Positive-working radiation-sensitive mixture and the production of relief patterns |
| abstract |
A positive-working UV-sensitive mixture containing n (a1) an organic binder containing acid-labile ether, ester or carbonate groups or n (a2) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and n (a2.1) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid, or n (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a group which forms an acid under the action of radiation, or a mixture of the organic compounds (a2.1) and (a2.2) and n (b) an arylsulfonic ester, is suitable for the production of relief patterns. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004202961-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6790589-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7465529-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100379078-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8557144-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010009296-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5756254-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007037090-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5731123-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7179580-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03041206-A1 |
| priorityDate |
1991-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |