| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_15dcf4c7aca54fa770d5089da455a2d7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-117
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-119 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate |
1995-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1996-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b1c26c29c07d89d61086f00db48aa43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2eac5b083c8d032bb802ad658b5f7c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27e38e39e98082f3abd4257ec49c68c1 |
| publicationDate |
1996-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5543262-A |
| titleOfInvention |
Benzanthrone polymerization gate in photopolymerizable compositions |
| abstract |
A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003205481-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE39835-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6667142-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6048375-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004180291-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6159646-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6960419-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7597935-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6296986-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003010440-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5900345-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6699350-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6495239-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6413699-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7045269-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005130064-A1 |
| priorityDate |
1995-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |