| abstract |
An inorganic thin film EL device comprises, on an insulating substrate 1, a back electrode 2, an insulating layer 3, a light emission layer 4, an insulating layer 3, and a transparent electrode 5 formed on the substrate 1 in this order. The emission layer comprises a fluoride of an alkaline earth metal and at least one member selected from the group consisting of rare earth element metals and compounds thereof at a mixing ratio by weight of 10:90 to 95:5. The rare earth element is, for example, cerium, praseodymium, neodium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium, ytterbium and mixture thereof. The compounds may be those compounds of the rare earth elements and fluorine, chlorine, bromine, iodine and oxygen. |