| abstract |
A top coat nail polish composition, which is at least substantially free of aromatic solvents, contains at least one cellulose ester, a mixture of aliphatic and cycloaliphatic solvents for the cellulose ester, a plasticizer for the cellulose ester, at least two UV blocking agents having different effective UV wavelength blockage ranges, a smoothing agent, an adhesion promoter, and an alkanol solvent for the smoothing agent and the adhesion promoter. |