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publicationDate 1995-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5439990-A
titleOfInvention Photolytic polymer and photoresist composition
abstract There is provided an highpolymer of the formula: <IMAGE> where at least one of R1 and R2 is either an alkyl group having 1 and 3 carbons atoms or an alkoxy group having 1 to 3 carbon atoms and the other is hydrogen, R3 is either a phenyl group or an alkyl group having 1 to 3 carbon atoms, x satisfies the condition that 0<x</=1, n is a positive integer in the range of from 5 to 700, Y- is a non-nucleophilic paired ion.
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