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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-331
filingDate 1994-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1994-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d6b62ee54b27332f512ef4bcda6618d
publicationDate 1994-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5376563-A
titleOfInvention Method of manufacturing an emitter base self alignment structure
abstract Using a silicon etched technique to remove an implanted base and emitter surrounding emitter-base islands, a "mesa" emitter structure can be formed. Using the structure, a self aligned P+ can be formed around emitter-base islands.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5614424-A
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Total number of triples: 22.